Enhanced cleaning performance for advanced chip manufacturing; Significant chemical savings and environmental benefitsFREMONT, Calif., Nov.07, 2024 (GLOBE NEWSWIRE) -- ACM Research, Inc.("ACM”) (NASDAQ: ACMR), a leading supplier of wafer processing solutions for semiconductor and advanced wafer-level packaging applications, today announced a major performance breakthrough for its flagship Ultra C Tahoe Cleaning tool.
Additional logic and memory customers are evaluating the tool, and we expect to deliver additional production units through the end of 2024. New Features and Benefits of the Upgraded Ultra C Tahoe Tool: Enhanced Particle Removal: The Tahoe platform’s advanced cleaning capabilities have achieved average particle counts of less than 6 particles at 26nm, meeting the stringent requirements for advanced node manufacturing.
ACM develops, manufactures and sells semiconductor process equipment for single-wafer or batch wet cleaning, electroplating, stress-free polishing, vertical furnace processes, Track and PECVD, which are critical to advanced semiconductor device manufacturing and wafer-level packaging. ACM is committed to delivering customized, high-performance, cost-effective process solutions that semiconductor manufacturers can use in numerous manufacturing steps to improve productivity and product yield.
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